DocumentCode
1432307
Title
Experimental Study of Design Parameters in Silicon Micropillar Array Solar Cells Produced by Soft Lithography and Metal-Assisted Chemical Etching
Author
Shin, Jae Cheol ; Chanda, Debashis ; Chern, Winston ; Yu, Ki Jun ; Rogers, John A. ; Li, Xiuling
Author_Institution
Dept. of Electr. & Comput. Sci. Eng., Univ. of Illinois, Urbana, IL, USA
Volume
2
Issue
2
fYear
2012
fDate
4/1/2012 12:00:00 AM
Firstpage
129
Lastpage
133
Abstract
Solar cells, consisting of core-shell p-n junction silicon micropillars on a thin membrane fabricated using soft lithography and metal-assisted chemical etching, are studied as a function of geometrical designs. Significant enhancement in absorption rate is found without much dependence on the pillar diameters in the range of 0.5-2 μm. However, the short-circuit current increases continuously with diameter, which is inversely proportional to the total surface area for a fixed diameter/pitch pillar array. This study provides unambiguous evidence that surface recombination is the dominant loss mechanism in nanowire- or micropillar-based solar cells.
Keywords
elemental semiconductors; etching; nanowires; p-n junctions; silicon; soft lithography; solar cells; surface recombination; absorption rate enhancement; core-shell p-n junction silicon micropillars; design parameters; dominant loss mechanism; fixed diameter-pitch pillar array; metal-assisted chemical etching; micropillar-based solar cells; nanowire-based solar cells; pillar diameters; short-circuit current; silicon micropillar array solar cells; size 0.5 mum to 2 mum; soft lithography; surface recombination; thin membrane; Absorption; Arrays; Etching; Metals; Photovoltaic cells; Silicon; Etching; nanopatterning; photovoltaic cells; semiconductor nanostructures;
fLanguage
English
Journal_Title
Photovoltaics, IEEE Journal of
Publisher
ieee
ISSN
2156-3381
Type
jour
DOI
10.1109/JPHOTOV.2011.2180894
Filename
6140534
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