• DocumentCode
    1432316
  • Title

    Analysis elastic??plastic behaviour and anisotropy properties of copper film from nanoindentation using numerical computation method

  • Author

    Xuesong Han ; Shuxin Wang ; Gan, Yong X ; Lianhong Zhang ; Siyuan Yu

  • Author_Institution
    Sch. of Mech. Eng., Tianjin Univ., Tianjin, China
  • Volume
    6
  • Issue
    1
  • fYear
    2011
  • fDate
    1/1/2011 12:00:00 AM
  • Firstpage
    13
  • Lastpage
    18
  • Abstract
    The determination of mechanical properties of nanoscale structures is becoming increasingly important as micro-system and ultra-large-scale integrated circuit technologies continue to mature. Traditional experimental methods cannot avoid the influence on the hardness measurement from the presence of the substrate. Numerical computation method of finite-element modelling with molecular dynamics simulation is used to determine the mechanical properties of copper thin film from indentation, quantifying the difference between load against displacement-into-surface curves obtained from different length scale. The results show that the materials deformation exhibits strong size dependence when the relevant physical length scales fall into the range of microns or below. The P-H graph justifies that the permanent plastic deformation quickly decreased while the elastic deformation gradually increased in the range of nanometre level which means increasing of material microhardness. The different deformation behaviour of crystal layers inside the films may be the potential key factor of its breaking off from the substrate. There is little anisotropy phenomenon in the elastic deformation stage whereas there is obvious anisotropy phenomenon in the plastic deformation process. The anisotropy of thin film has strict preferred orientation distribution and symmetry. The anisotropy deformation gradually minimised accompanying the increasing of plastic deformation illuminates the copper thin film is a nonlinear anisotropy elastic-plastic material.
  • Keywords
    copper; elastic deformation; finite element analysis; metallic thin films; microhardness; molecular dynamics method; nanoindentation; plastic deformation; Cu; P-H graph; anisotropy phenomenon; anisotropy properties; copper thin film; crystal layers; deformation behaviour; elastic deformation; elastic-plastic behaviour; finite-element modelling; hardness measurement; material microhardness; microsystem integrated circuit technologies; molecular dynamics simulation; nanoindentation; nanoscale structure; nonlinear anisotropy elastic-plastic material; numerical computation method; orientation distribution; permanent plastic deformation; strong size dependence; ultralarge-scale integrated circuit technologies;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2010.0119
  • Filename
    5696814