• DocumentCode
    1432358
  • Title

    Tri-Gate Normally-Off GaN Power MISFET

  • Author

    Lu, Bin ; Matioli, Elison ; Palacios, Tomás

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
  • Volume
    33
  • Issue
    3
  • fYear
    2012
  • fDate
    3/1/2012 12:00:00 AM
  • Firstpage
    360
  • Lastpage
    362
  • Abstract
    We present a new normally-off GaN transistor-the tri-gate normally-off GaN metal-insulator-semiconductor field- effect transistor (MISFET). Due to the excellent channel control of a new 3-D gate structure, a breakdown voltage of 565 V has been achieved at a drain leakage current of 0.6 μA/mm and Vgs = 0. The new device has an on/off current ratio of more than eight orders of magnitude and a subthreshold slope of 86 ± 9 mV/decade. The threshold voltage of the new device is 0.80 ± 0.06 V with a maximum drain current of 530 mA/mm. These results confirm the great potential of the tri-gate normally-off GaN-on-Si MISFETs for the next generation of power electronics.
  • Keywords
    III-V semiconductors; MISFET; gallium compounds; leakage currents; power MOSFET; wide band gap semiconductors; 3D gate structure; GaN; drain current; drain leakage current; metal-insulator-semiconductor field-effect transistor; on/off current ratio; subthreshold slope; threshold voltage; tri-gate normally-off power MISFET; voltage 565 V; Aluminum gallium nitride; Gallium nitride; HEMTs; Leakage current; Logic gates; MISFETs; GaN transistor; normally-off; power electronics; tri-gate;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2179971
  • Filename
    6140542