Title :
Room-temperature 2.2-μm InAs-InGaAs-InP highly strained multiquantum-well lasers grown by gas-source molecular beam epitaxy
Author :
Wang, Jyh-Shyang ; Lin, Hao-Hsiung ; Sung, Li-Wei
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fDate :
10/1/1998 12:00:00 AM
Abstract :
We report the fabrication and performances of 2.2-μm InAs-InGaAs-InP highly strained multiple-quantum-well (MQW) lasers grown by gas-source molecular beam epitaxy. The lasers operated at room temperature demonstrate a threshold current density of 900 A/cm2 a maximum external quantum efficiency of 28%, and a maximum output power exceeding 60 mW per facet. To the best of our knowledge, this is the longest room-temperature emission wavelength reported for lasers grown on InP substrates to date. The effect of strain compensation on the quality of the InAs-InxGa1-xAs MQW´s was also studied using double crystal X-ray diffractometry and photoluminescence techniques. The experimental results reveal that there is no significant difference on the epilayer quality of the samples with strain compensation. However, the group V stable surface growth condition is indeed better than the group III stable surface growth condition on the epilayer quality
Keywords :
III-V semiconductors; X-ray diffraction; current density; gallium arsenide; indium compounds; laser beams; molecular beam epitaxial growth; optical fabrication; photoluminescence; quantum well lasers; 2.2 mum; 298 K; 60 mW; InAs-InxGa1-xAs; InAs-InGaAs-InP; InP substrates; double crystal X-ray diffractometry; epilayer quality; fabrication; gas-source molecular beam epitaxy; group III stable surface growth condition; group V stable surface growth condition; highly strained multiquantum-well lasers; maximum external quantum efficiency; maximum output power; performances; photoluminescence techniques; room temperature; room-temperature emission wavelength; strain compensation; threshold current density; Capacitive sensors; Gas lasers; Molecular beam epitaxial growth; Optical device fabrication; Power generation; Power lasers; Quantum well devices; Temperature; Threshold current; X-ray lasers;
Journal_Title :
Quantum Electronics, IEEE Journal of