All-MOCVD Technology for Coated Conductor Fabrication

Author

Molodyk, Alexander ; Novozhilov, Mikhail ; Street, Susan ; Castellani, Louis ; Ignatiev, Alex

Author_Institution

Metal Oxide Technol. Inc. (MetOx)β, Houston, TX, USA

Volume

21

Issue

3

fYear

2011

fDate

6/1/2011 12:00:00 AM

Firstpage

3175

Lastpage

3178

Abstract

The deposition of all buffer and YBCO layers for coated conductors via MOCVD represents one of the lowest possible capital and operational cost approaches to coated conductor manufacturing. Modular design of our prototype MOCVD system allows for either in-line or parallel fabrication of any number of buffer layers and YBCO layers. At 77 K in self-field I_c >; 200 A/cm has been reproducibly demonstrated on all-MOCVD architecture, the best up-to-date result being I_c = 236 A/cm and J_c = 2.13 MA/cm². Measurements performed at 4.2 K in 12 T magnetic field have shown J_e = 278 A/mm². The results achieved, combined with the low cost, make the all-MOCVD coated conductors very promising materials for application both at liquid nitrogen and liquid helium temperatures.

Keywords

MOCVD; barium compounds; buffer layers; coatings; conductors (electric); high-temperature superconductors; superconducting thin films; yttrium compounds; YBCO; YBCO layer; all-MOCVD technology; buffer layer; coated conductor fabrication; liquid helium temperature; liquid nitrogen temperature; magnetic flux density 12 T; modular design; parallel fabrication; temperature 4.2 K; temperature 77 K; Buffer layers; Conductors; MOCVD; Superconducting magnets; Yttrium barium copper oxide; Buffer layers; MOCVD; YBCO; coated conductors;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/TASC.2010.2099637

Filename

5699372