DocumentCode
1434222
Title
Low Thermal Resistances at GaN–SiC Interfaces for HEMT Technology
Author
Cho, Jungwan ; Bozorg-Grayeli, Elah ; Altman, David H. ; Asheghi, Mehdi ; Goodson, Kenneth E.
Author_Institution
Dept. of Mech. Eng., Stanford Univ., Stanford, CA, USA
Volume
33
Issue
3
fYear
2012
fDate
3/1/2012 12:00:00 AM
Firstpage
378
Lastpage
380
Abstract
The temperature rise in AlGaN/GaN high-electron-mobility transistors depends strongly on the GaN-substrate thermal interface resistance (TIR). We apply picosecond time-domain thermoreflectance measurements to GaN-SiC composite substrates with varying GaN thickness to extract both the TIR and the intrinsic GaN thermal conductivity at room temperature. Two complementary data extraction methodologies yield 4-5 for the GaN-SiC TIR and 157-182 for the GaN conductivity. The GaN-SiC interface resistance values reported here, as well as the TIR experimental uncertainties documented in this letter, are substantially lower than those reported previously for this material combination.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device measurement; thermal conductivity; thermal resistance; thermal resistance measurement; thermoreflectance; AlGaN-GaN; GaN-SiC; HEMT; complementary data extraction methodology; composite substrates; high-electron mobility transistors; low thermal resistances; picosecond time-domain thermoreflectance measurement; thermal conductivity; thermal interface resistance; Conductivity; Gallium nitride; Silicon carbide; Temperature measurement; Thermal conductivity; Thermal resistance; AlGaN/GaN high-electron-mobility transistors (HEMTs); picosecond pump–probe thermometry; thermal conductivity; thermal interface resistance (TIR);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2181481
Filename
6142005
Link To Document