DocumentCode :
1434415
Title :
High-Frequency Half-Bit Shift Register With Amorphous-Oxide TFT
Author :
Jamshidi-Roudbari, Abbas ; Khan, Shahrukh Akbar ; Hat, Miltiadis K.
Author_Institution :
Dept. of Electr. & Comput. Eng., Lehigh Univ., Bethlehem, PA, USA
Volume :
31
Issue :
4
fYear :
2010
fDate :
4/1/2010 12:00:00 AM
Firstpage :
320
Lastpage :
322
Abstract :
We have designed, fabricated, and successfully characterized a ten-stage half-bit shift register utilizing amorphous In-Ga-Zn-O (a-IGZO) thin-film-transistor (TFT) technology. High-performance bottom-gate staggered TFT structures with aluminum source, drain, and gate electrodes and RF-sputtered a-IGZO active material has been developed with a field-effect mobility of 16 cm2/V ??s. The half-bit shift register, which consists of only seven transistors per stage, has been successfully driven at a maximum clock frequency of 40 kHz (sufficient to drive a full VGA display at a frame rate of more than 80 kHz) and minimum rail-to-rail supply voltage of 20 V. This effort further demonstrates the potential of oxide-TFT technology to be employed for systems with higher integration level.
Keywords :
amorphous semiconductors; gallium compounds; indium compounds; shift registers; sputter deposition; thin film transistors; InGaZnO; RF-sputtered a-IGZO active material; amorphous In-Ga-Zn-O thin-film-transistor; amorphous-oxide TFT; bottom-gate staggered TFT structures; frequency 40 kHz; high-frequency half-bit shift register; voltage 20 V; Indium Gallium Zinc Oxide (IGZO); TFTs; oxide thin-film transistor (TFT); shift register;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2041181
Filename :
5427077
Link To Document :
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