DocumentCode
1435128
Title
Analytical Model of Undoped Polycrystalline Silicon Thin-Film Transistors Consistent With Pao-Sah Model
Author
He, Hongyu ; Zheng, Xueren
Author_Institution
Sch. of Electron. & Inf. Eng., South China Univ. of Technol., Guangzhou, China
Volume
58
Issue
4
fYear
2011
fDate
4/1/2011 12:00:00 AM
Firstpage
1102
Lastpage
1107
Abstract
A physical-based analytical direct current model is developed for undoped polycrystalline silicon thin-film transistors including both subthreshold and above-threshold regimes by assuming an exponential density of trap states. Based on the charge sheet method, diffusion and drift currents are calculated in the subthreshold regime. The parameter is introduced to describe the increase in trapped charge with increasing gate voltage in the above-threshold regime, and a new simple drain current expression is presented. The proposed model is compared with the Pao-Sah model and verified with the experimental data. A good agreement is obtained.
Keywords
elemental semiconductors; silicon; thin film transistors; Pao-Sah model; Si; above-threshold regime; charge sheet method; diffusion currents; drift currents; exponential density; physical-based analytical direct current model; subthreshold regimes; trap states; undoped polycrystalline thin-film transistors consistent; Analytical model; polycrystalline silicon (poly-Si); thin-film transistors (TFTs); transfer characteristics; trap states;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2103380
Filename
5701661
Link To Document