• DocumentCode
    1435128
  • Title

    Analytical Model of Undoped Polycrystalline Silicon Thin-Film Transistors Consistent With Pao-Sah Model

  • Author

    He, Hongyu ; Zheng, Xueren

  • Author_Institution
    Sch. of Electron. & Inf. Eng., South China Univ. of Technol., Guangzhou, China
  • Volume
    58
  • Issue
    4
  • fYear
    2011
  • fDate
    4/1/2011 12:00:00 AM
  • Firstpage
    1102
  • Lastpage
    1107
  • Abstract
    A physical-based analytical direct current model is developed for undoped polycrystalline silicon thin-film transistors including both subthreshold and above-threshold regimes by assuming an exponential density of trap states. Based on the charge sheet method, diffusion and drift currents are calculated in the subthreshold regime. The parameter is introduced to describe the increase in trapped charge with increasing gate voltage in the above-threshold regime, and a new simple drain current expression is presented. The proposed model is compared with the Pao-Sah model and verified with the experimental data. A good agreement is obtained.
  • Keywords
    elemental semiconductors; silicon; thin film transistors; Pao-Sah model; Si; above-threshold regime; charge sheet method; diffusion currents; drift currents; exponential density; physical-based analytical direct current model; subthreshold regimes; trap states; undoped polycrystalline thin-film transistors consistent; Analytical model; polycrystalline silicon (poly-Si); thin-film transistors (TFTs); transfer characteristics; trap states;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2103380
  • Filename
    5701661