Title :
Optical lithography stalls X-rays
Author :
Flores, Gary E. ; Kirkpatrick, Bruce
Author_Institution :
KTI Chem. Inc., Sunnyvale, CA, USA
Abstract :
The revival in optical lithography resulting from continuing advances in photoresists, phase-shifting masks, high-numerical-aperture step-and-repeat optical systems, multilevel-resist processing, and top-surface imaging techniques is discussed. Optical lithography is being used to make advanced IC chips, with 0.35 mu m geometries in research, 0.5 mu m in production. Ultraviolet (UV) light in the 200-400 nm range is the predominant system for IC manufacturing technology. Deep-UV lithography is not yet accepted for production processes, mostly due to the lack of commercially available positive and negative-tone photoresist systems for deep-UV wavelengths. In addition, negative-tone resists are temperature-sensitive and therefore hard to handle in a manufacturing environment, extensive gas-handling facilities are required for deep-UV excimer laser sources, and optical components have to be replaced often because the intense laser energy devitrifies lenses quickly.<>
Keywords :
integrated circuit manufacture; photolithography; 0.35 micron; 0.5 micron; 200 to 400 nm; IC chips; IC manufacturing technology; deep UV lithography; deep-UV excimer laser sources; high-numerical-aperture; lens devitrification; multilevel-resist processing; negative-tone resists; optical lithography; phase-shifting masks; photoresists; positive tone resists; step-and-repeat optical systems; top-surface imaging; Gas lasers; Geometrical optics; Lithography; Manufacturing; Optical devices; Optical imaging; Photonic integrated circuits; Production systems; Resists; X-rays;
Journal_Title :
Spectrum, IEEE