DocumentCode
1437073
Title
An inverse pinch plasma source for plasma opening switches
Author
Moschella, John J. ; Hazelton, Richard C. ; Vidoli, Caterina ; Yadlowsky, Edward J.
Author_Institution
HY-Tech Res. Corp., Radford, VA, USA
Volume
28
Issue
6
fYear
2000
fDate
12/1/2000 12:00:00 AM
Firstpage
2247
Lastpage
2255
Abstract
A plasma source has been developed for use in cylindrical plasma opening switches (POS). The “inverse pinch” (IP) produces a radially expanding plasma ring formed from a gas puff and is designed to be mounted inside the center conductor of a POS. Interferometric measurements and magnetic probes were used to study the expansion dynamics of the plasma that behaves similar to an ideal snowplow. Plasma density measurements were also made with the source in a POS configuration. These measurements have shown that the IP injects a discrete quantity of plasma into the POS gap over time scales of interest. This results in a number of different plasma density distributions depending on the source delay. Furthermore, the quantity of plasma can be controlled by adjusting the size of the gas puff. This fact, coupled with the ability to vary the type of gas, enables the inverse pinch to supply to the POS a wide range of mass densities
Keywords
plasma density; plasma production; plasma switches; center conductor; cylindrical plasma opening switches; expansion dynamics; gas puff size; ideal snowplow; interferometric measurements; inverse pinch plasma source; magnetic probes; plasma density distributions; plasma density measurements; radially expanding plasma ring; snowplough; time scales; Conductors; Delay; Density measurement; Plasma density; Plasma measurements; Plasma sources; Probes; Size control; Switches; Time measurement;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.902253
Filename
902253
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