DocumentCode :
1437124
Title :
Quantum Hall Resistance Standards With Good Quantization at High Electron Mobilities
Author :
Pierz, Klaus ; Götz, Martin ; Pesel, Eckart ; Ahlers, Franz-Josef ; Schumacher, Hans Werner
Author_Institution :
Phys.-Tech. Bundesanstalt, Braunschweig, Germany
Volume :
60
Issue :
7
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
2455
Lastpage :
2461
Abstract :
We study the magnetotransport properties and Hall resistance quantization in a set of AlGaAs/GaAs heterostructures grown in a high-mobility molecular beam epitaxy system. The data show that, with reduced spacer layer width, the electron mobility in such heterostructures can be reduced to moderate mobility values of ~6 × 105 cm2/(V · s). We And good resistance quantization, allowing for a metrological application not only for a quantum Hall device with moderate electron mobility but also for a high-mobility device with an electron mobility of 2.2 × 106 cm2/(V · s).
Keywords :
Hall effect devices; Hall mobility; III-V semiconductors; aluminium compounds; gallium arsenide; molecular beam epitaxial growth; quantum Hall effect; AlGaAs-GaAs; Hall resistance quantization; heterostructure; high electron mobility; high-mobility device; high-mobility molecular beam epitaxy system; magnetotransport properties; quantum Hall device; quantum hall resistance standard; spacer layer width; Conductivity; Current measurement; Electrical resistance measurement; Quantization; Resistance; Scattering; Temperature measurement; 2-D electron systems; Electrical quantum standards; integer quantum Hall effect (QHE); molecular beam epitaxy (MBE) growth; quantum Hall resistance (QHR) standard;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/TIM.2010.2100651
Filename :
5703129
Link To Document :
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