• DocumentCode
    1437124
  • Title

    Quantum Hall Resistance Standards With Good Quantization at High Electron Mobilities

  • Author

    Pierz, Klaus ; Götz, Martin ; Pesel, Eckart ; Ahlers, Franz-Josef ; Schumacher, Hans Werner

  • Author_Institution
    Phys.-Tech. Bundesanstalt, Braunschweig, Germany
  • Volume
    60
  • Issue
    7
  • fYear
    2011
  • fDate
    7/1/2011 12:00:00 AM
  • Firstpage
    2455
  • Lastpage
    2461
  • Abstract
    We study the magnetotransport properties and Hall resistance quantization in a set of AlGaAs/GaAs heterostructures grown in a high-mobility molecular beam epitaxy system. The data show that, with reduced spacer layer width, the electron mobility in such heterostructures can be reduced to moderate mobility values of ~6 × 105 cm2/(V · s). We And good resistance quantization, allowing for a metrological application not only for a quantum Hall device with moderate electron mobility but also for a high-mobility device with an electron mobility of 2.2 × 106 cm2/(V · s).
  • Keywords
    Hall effect devices; Hall mobility; III-V semiconductors; aluminium compounds; gallium arsenide; molecular beam epitaxial growth; quantum Hall effect; AlGaAs-GaAs; Hall resistance quantization; heterostructure; high electron mobility; high-mobility device; high-mobility molecular beam epitaxy system; magnetotransport properties; quantum Hall device; quantum hall resistance standard; spacer layer width; Conductivity; Current measurement; Electrical resistance measurement; Quantization; Resistance; Scattering; Temperature measurement; 2-D electron systems; Electrical quantum standards; integer quantum Hall effect (QHE); molecular beam epitaxy (MBE) growth; quantum Hall resistance (QHR) standard;
  • fLanguage
    English
  • Journal_Title
    Instrumentation and Measurement, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9456
  • Type

    jour

  • DOI
    10.1109/TIM.2010.2100651
  • Filename
    5703129