DocumentCode
1437473
Title
Graphene-Side-Gate Engineering
Author
Chen, Ching-Tzu ; Low, Tony ; Chiu, Hsin-Ying ; Zhu, Wenjuan
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
33
Issue
3
fYear
2012
fDate
3/1/2012 12:00:00 AM
Firstpage
330
Lastpage
332
Abstract
Various mesoscopic devices exploit electrostatic side gates for their operation. In this letter, we investigate how voltage biasing of graphene side gates modulates the electrical transport characteristics of a graphene channel. We explore myriads of typical side-gated devices such as symmetric dual-side gates and asymmetric single-side gates, in monolayer and bilayer graphene. The side gates modulate the electrostatic doping in the graphene channel whose effect is reflected in transport measurement. This modulation efficiency is systematically characterized for all our devices and agrees well with the modeling presented.
Keywords
electrostatic devices; field effect transistors; graphene; C; asymmetric single-side gates; bilayer graphene; electrical transport characteristics; electrostatic doping; electrostatic side gates; graphene channel; graphene field-effect transistor; graphene-side-gate engineering; mesoscopic devices; modulation efficiency; monolayer graphene; symmetric dual-side gates; transport measurement; Electrical resistance measurement; Electrostatic measurements; Electrostatics; Logic gates; Modulation; Resistance; Transistors; Electrostatics; graphene field-effect transistor (FET); side gate;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2180355
Filename
6144689
Link To Document