• DocumentCode
    1437473
  • Title

    Graphene-Side-Gate Engineering

  • Author

    Chen, Ching-Tzu ; Low, Tony ; Chiu, Hsin-Ying ; Zhu, Wenjuan

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    33
  • Issue
    3
  • fYear
    2012
  • fDate
    3/1/2012 12:00:00 AM
  • Firstpage
    330
  • Lastpage
    332
  • Abstract
    Various mesoscopic devices exploit electrostatic side gates for their operation. In this letter, we investigate how voltage biasing of graphene side gates modulates the electrical transport characteristics of a graphene channel. We explore myriads of typical side-gated devices such as symmetric dual-side gates and asymmetric single-side gates, in monolayer and bilayer graphene. The side gates modulate the electrostatic doping in the graphene channel whose effect is reflected in transport measurement. This modulation efficiency is systematically characterized for all our devices and agrees well with the modeling presented.
  • Keywords
    electrostatic devices; field effect transistors; graphene; C; asymmetric single-side gates; bilayer graphene; electrical transport characteristics; electrostatic doping; electrostatic side gates; graphene channel; graphene field-effect transistor; graphene-side-gate engineering; mesoscopic devices; modulation efficiency; monolayer graphene; symmetric dual-side gates; transport measurement; Electrical resistance measurement; Electrostatic measurements; Electrostatics; Logic gates; Modulation; Resistance; Transistors; Electrostatics; graphene field-effect transistor (FET); side gate;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2180355
  • Filename
    6144689