DocumentCode
1437972
Title
Dielectric small-signal response by protons in amorphous insulators
Author
Kliem, H.
Author_Institution
Inst. fuer Werkstoffe der Elektrotech., Aachen Univ. of Technol., West Germany
Volume
24
Issue
2
fYear
1989
fDate
4/1/1989 12:00:00 AM
Firstpage
185
Lastpage
197
Abstract
A model is proposed in which protons fluctuate between neighboring atomic shells either by thermal activation or by a tunneling process. The transition probability of the protons depends on the distance between the adjacent atoms. The characteristic pair distribution function of interatomic distances in the amorphous state is a consequence of locally minimizing the potential energy of the atoms during condensation, as has been shown by F.F. Abraham (1980). This general principle of minimizing the energy leads to similar distribution functions in different materials. Therefore, different types of insulators have a similar relaxational behavior. Experiments carried out with thin films of aluminum oxide and polyimide confirm quantitatively the proposed model
Keywords
alumina; dielectric thin films; electrical conductivity of amorphous semiconductors and insulators; electronic conduction in insulating thin films; organic insulating materials; polymer films; Al2O3 thin films; alumina; amorphous insulators; dielectric small signal response by protons; distribution functions; interatomic distances; model; polyimide; proton fluctuate between atoms; thermal activation; tunneling process; Aluminum oxide; Amorphous materials; Dielectrics and electrical insulation; Distribution functions; Frequency domain analysis; Hydrogen; Polarization; Polyimides; Protons; Silicon;
fLanguage
English
Journal_Title
Electrical Insulation, IEEE Transactions on
Publisher
ieee
ISSN
0018-9367
Type
jour
DOI
10.1109/14.90270
Filename
90270
Link To Document