DocumentCode
1438036
Title
Interconnect design strategy: structures, repeaters and materials with strategic system performance analysis (S2PAL) model
Author
Takahashi, Shuji ; Edahiro, Masato ; Hayashi, Yoshihiro
Author_Institution
Syst. LSI Design Eng. Div., Kanagawa, Japan
Volume
48
Issue
2
fYear
2001
fDate
2/1/2001 12:00:00 AM
Firstpage
239
Lastpage
251
Abstract
In this paper, we propose a novel methodology for scheming an interconnect strategy, such as what interconnect structure should be taken, how repeaters should be inserted, and when new metal or dielectric materials should be adopted. In the methodology, the strategic system performance analysis model is newly developed as a calculation model that predicts LSI operation frequency and chip size with electrical parameters of transistors and interconnects as well as circuit configuration. The analysis with the model indicates that interconnect delay overcomes circuit block cycle time at a specific length; Dc-cross. Here tentatively, interconnects shorter than Dc-cross are called local interconnects, and interconnects longer than that as global ones. The cross-sectional structures for local and global tiers are optimized separately. We also calculate global interconnect pitch and the chip size enlarged by the global interconnect pitch and the inserted repeaters, and then estimate the effectiveness of introducing new materials for interconnects and dielectrics
Keywords
VLSI; circuit layout CAD; delay estimation; integrated circuit interconnections; integrated circuit layout; integrated circuit modelling; large scale integration; LSI operation frequency; S2PAL model; chip size; circuit block cycle time; cross-sectional structures; electrical parameters; global interconnects; interconnect delay; interconnect design strategy; interconnect materials; interconnect pitch; local interconnects; repeaters; strategic system performance analysis model; Delay; Design automation; Design engineering; Dielectric materials; Integrated circuit interconnections; Large scale integration; Performance analysis; Process design; Repeaters; System performance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.902722
Filename
902722
Link To Document