• DocumentCode
    1438881
  • Title

    Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors

  • Author

    Farmakis, F.V. ; Brini, J. ; Kamarinos, G. ; Dimitriadis, C.A.

  • Author_Institution
    Lab. de Phys. des Composants a Semicond., ENSERG, Grenoble, France
  • Volume
    22
  • Issue
    2
  • fYear
    2001
  • Firstpage
    74
  • Lastpage
    76
  • Abstract
    In this letter, we present experimental data showing that hot-carrier stress in laser annealed polycrystalline silicon thin-film transistors provokes an anomalous turn-on voltage variation. Although under various hot-carrier stress intensities the maximum transconductance degradation shows the same power-time dependent law, turn-on voltage can exhibit different behaviors. This observation lead to the conclusion that turn-on voltage depends on two different degradation mechanisms: injection of hot carriers into the gate oxide and degradation of grain boundaries. We show that these two mechanisms may be distinguished since they obey different power-time dependent laws as a function of stress duration.
  • Keywords
    elemental semiconductors; grain boundaries; hot carriers; laser beam annealing; semiconductor device reliability; silicon; thin film transistors; Si-SiO/sub 2/; anomalous turn-on voltage degradation; gate oxide; grain boundary degradation; hot carrier injection; hot-carrier stress; laser annealing; maximum transconductance degradation; polycrystalline silicon thin-film transistors; polysilicon TFT; power-time dependent law; stress duration; Annealing; Degradation; Grain boundaries; Hot carriers; Lead compounds; Silicon; Stress; Thin film transistors; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.902836
  • Filename
    902836