Title :
Switching Behavior in Rare-Earth Films Fabricated in Full Room Temperature
Author :
Pan, Tung-Ming ; Lu, Chih-Hung
Author_Institution :
Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan
fDate :
4/1/2012 12:00:00 AM
Abstract :
In this paper, we investigated the forming-free resistive-switching (RS) behavior in the Ru/REOx/TaN ( RE = Ce, Pr, Sm, and Eu) memory device using CeOx, PrOx, SmOx, and EuOx thin films fabricated in a full-room-temperature process. The dominant conduction mechanism of Ru/REOx/TaN memory devices in the low-resistance state is ohmic behavior, whereas the high-resistance state is space-charge-limited conduction. The Ru/CeOx/TaN devices show a high resistance ratio of >;104, reliable data retention for 105 s, and stable endurance characteristics for up to 1000 cycles. This result suggests the high concentration of the cerium ions and the low density of chemical defects (oxygen vacancies) in the CeOx film. The Ru/CeOx/TaN structure memory is a very promising candidate for future nonvolatile RS memory applications.
Keywords :
random-access storage; semiconductor thin films; storage management chips; memory device; nonvolatile RS memory; ohmic behavior; rare-earth films; resistive-switching behavior; thin films; Chemicals; Electrodes; Electron traps; Ions; Resistance; Switches; Three dimensional displays; $hbox{CeO}_{x}$; $hbox{EuO}_{x}$; $hbox{PrO}_{x}$; $hbox{SmO}_{x}$ ; forming free; rare-earth (RE); resistive-switching (RS);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2012.2182676