DocumentCode :
1441131
Title :
Bulk Planar Junctionless Transistor (BPJLT): An Attractive Device Alternative for Scaling
Author :
Gundapaneni, Suresh ; Ganguly, Swaroop ; Kottantharayil, Anil
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol. Bombay, Mumbai, India
Volume :
32
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
261
Lastpage :
263
Abstract :
We propose a novel highly scalable source-drain-junction-free field-effect transistor that we call the bulk planar junctionless transistor (BPJLT). This builds upon the idea of an isolated ultrathin highly doped device layer of which volume is fully depleted in the off-state and is around flatband in the on-state. Here, the leakage current depends on the effective device layer thickness, and we show that with well doping and/or well bias, this can be controllably made less than the physical device layer thickness in a bulk planar junction-isolated structure. We demonstrate by extensive device simulations that these additional knobs for controlling short-channel effects reduce the off-state leakage current by orders of magnitude for similar on-state currents, making the BPJLT highly scalable.
Keywords :
field effect transistors; leakage currents; OFF-state leakage current; ON-state leakage current; bulk planar junctionless transistor; isolated ultrathin highly doped device layer; physical device layer thickness; scaling; short-channel effects; source-drain-junction-free field-effect transistor; Doping; Junctions; Logic gates; Mathematical model; Metals; Semiconductor process modeling; Transistors; Gated resistor; junctionless transistor (JLT); scaling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2099204
Filename :
5706338
Link To Document :
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