DocumentCode :
1441181
Title :
Highly Uniform Switching of Tantalum Embedded Amorphous Oxide Using Self-Compliance Bipolar Resistive Switching
Author :
Chang Bum Lee ; Dong Soo Lee ; Benayad, A. ; Seung Ryul Lee ; Man Chang ; Myoung-Jae Lee ; Jihyun Hur ; Chang Jung Kim ; U-In Chung
Author_Institution :
Semicond. Lab., Samsung Adv. Inst. of Technol., Yongin, South Korea
Volume :
32
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
399
Lastpage :
401
Abstract :
A new approach of self-compliance bipolar switching of tantalum embedded amorphous oxide for highly reliable and uniform switching was investigated. Based on analytic results, the formation of a metallic tantalum embedded amorphous oxide film was confirmed. Robust characteristics of over cycles with no change at both resistance states under voltage pulses were achieved due to the self-compliance function, which originated from the limitation of current by metallic ohmic load resistance. In addition, an oxygen plasma pulse method for interface oxidation was demonstrated.
Keywords :
amorphous state; electrical conductivity transitions; electrical resistivity; oxidation; tantalum compounds; thin films; Ta2O5; interface oxidation; metallic ohmic load resistance; metallic tantalum embedded amorphous oxide film; oxygen plasma pulse method; resistance states; robust characteristics; self-compliance bipolar resistive switching; uniform switching; Ions; Metals; Oxidation; Resistance; Switches; Switching circuits; Nonvolatile memory; resistive switching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2101044
Filename :
5706345
Link To Document :
بازگشت