DocumentCode :
1441387
Title :
Hydrogen-related defects in irradiated SiO2
Author :
Bunson, E. ; Di Ventra, M. ; Pantelides, S.T. ; Fleetwood, D.M. ; Schrimpf, R.D.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
Volume :
47
Issue :
6
fYear :
2000
fDate :
12/1/2000 12:00:00 AM
Firstpage :
2289
Lastpage :
2296
Abstract :
The energetics of proton and hydrogen release from hydrogen-complexed defects in silicon dioxide are compared using first-principles density functional theory. These calculations are used to assess models of total dose buildup of interface traps and charge trapping in silicon dioxide. It is found that hydrogen-passivated oxygen vacancies are a likely source of hydrogen and that proton release is favored by at least 1.2 eV over the release of neutral hydrogen. It is also found that the formation energies of most defects do not depend strongly on the local environment in amorphous SiO2. However, the energy of a proton bound to different bridging oxygen sites can vary by more than 1.0 eV. Even when this is taken into account, proton release still dominates over neutral hydrogen release by more than 0.5 eV. Calculations also show that one defect, the hydrogen bridge, may be a source of EPR inactive, trapped positive charge in the oxide
Keywords :
density functional theory; hydrogen; interface states; passivation; radiation effects; silicon compounds; vacancies (crystal); EPR; SiO2:H; amorphous silicon dioxide; bridging oxygen site; charge trapping; defect formation energy; first-principles density functional theory; hydrogen passivation; hydrogen-defect complex; interface trap; neutral hydrogen release; oxygen vacancy; proton release; radiation damage; Amorphous materials; Bridges; Density functional theory; Hydrogen; Leakage current; MOS devices; Paramagnetic resonance; Physics; Protons; Silicon compounds;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.903767
Filename :
903767
Link To Document :
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