DocumentCode :
1441428
Title :
2 MeV proton radiation damage studies of gallium nitride films through low temperature photoluminescence spectroscopy measurements
Author :
Khanna, Shyam M. ; Webb, Jim ; Tang, H. ; Houdayer, Alain J. ; Carlone, Cosmo
Author_Institution :
Defense Res. Establ., Ottawa, Ont., Canada
Volume :
47
Issue :
6
fYear :
2000
fDate :
12/1/2000 12:00:00 AM
Firstpage :
2322
Lastpage :
2328
Abstract :
Gallium nitride (GaN) thin film samples were grown by ammonia-molecular beam epitaxy. Through room temperature transport measurements, electron mobilities of 560 cm2/Vs were observed for layers with a carrier density of 1.5×1017 cm-3 . Room temperature photoluminescence (PL) spectroscopy revealed the bound exciton transition at 363.0 nm and a weak yellow emission whose intensity was sample dependent. At 22 K, the main photoluminescence signal sharpened, shifted to 356.9 nm (3.474 eV), and the maximum intensity increased by a factor of one hundred; the intensity of the yellow emission decreased. The samples were irradiated at room temperature with 2 MeV protons at fluences of 109, 10 10, 1011, 1012, 1013, 1014, 1015, and 1016 cm-2. The intensity changes were within experimental error up to 1013 cm-2. The drop in intensity of the bound exciton transition was 16% at 1014 cm-2 and 99% at 1015 cm-2. The radiation damage constant associated with the main PL peak at 3.474 eV in GaN is (1.4±0.3)×10-13 cm2, compared with (4±1)×10-11 cm2 associated with the main PL, peak at 1.492 eV in GaAs. For photonic applications, GaN is more robust than GaAs with respect to displacement damage
Keywords :
III-V semiconductors; carrier density; electron mobility; excitons; gallium compounds; photoluminescence; proton effects; semiconductor epitaxial layers; wide band gap semiconductors; 2 MeV; 22 K; GaN; bound exciton transition; carrier density; electron mobility; gallium nitride thin film; low temperature photoluminescence spectroscopy; molecular beam epitaxy; proton radiation damage; Epitaxial growth; Excitons; Gallium arsenide; Gallium nitride; III-V semiconductor materials; Molecular beam epitaxial growth; Photoluminescence; Protons; Temperature measurement; Transistors;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.903772
Filename :
903772
Link To Document :
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