DocumentCode :
1441450
Title :
Influence of stress on rotational loss in silicon iron
Author :
Basak, A. ; Moses, A.J.
Author_Institution :
University College Cardiff, Department of Electrical and Electronic Engineering, Wolfson Centre for Magnetics Technology, Cardiff, UK
Volume :
125
Issue :
2
fYear :
1978
fDate :
2/1/1978 12:00:00 AM
Firstpage :
165
Lastpage :
168
Abstract :
The stress sensitivity of rotational-power loss in silicon iron has been investigated. The loss increases with tensile stress applied parallel to the rolling direction and decreases with compression. The opposite occurs when the stress is applied perpendicular to the rolling direction. The loss varies in a similar fashion over the flux-density range investigated. Increasing the frequency causes the loss to rise drastically and also increases its stress sensitivity. It has also been shown theoretically that the angle of lag of the flux density behind the applied field increases with stress and varies during the magnetising cycle.
Keywords :
iron alloys; laminations; magnetic cores; magnetic leakage; silicon alloys; stress effects; flux density; magnetising cycle; rotational loss; silicon iron; stress;
fLanguage :
English
Journal_Title :
Electrical Engineers, Proceedings of the Institution of
Publisher :
iet
ISSN :
0020-3270
Type :
jour
DOI :
10.1049/piee.1978.0045
Filename :
5253247
Link To Document :
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