DocumentCode :
1441589
Title :
High-energy proton-induced dark signal in silicon charge coupled devices
Author :
Robbins, Mark Stanford
Author_Institution :
Marconi Appl. Technol. Ltd., Chelmsford, UK
Volume :
47
Issue :
6
fYear :
2000
fDate :
12/1/2000 12:00:00 AM
Firstpage :
2473
Lastpage :
2479
Abstract :
The distribution of dark signal in 10 and 60 MeV proton irradiated charge-coupled devices is discussed and a newly modified theory of proton-induced dark signal nonuniformity is compared with measurements made on devices from Marconi Applied Technologies with differing pixel sizes. The models previously developed by other workers have been modified to enable better agreement with measurement at low proton fluency. The scaling of bulk dark signal with damage energy as a function of temperature is presented. This makes possible predictions of the mean bulk dark signal and its distribution for a wide range of device types, temperatures and proton fluencies. The dark signal increase from Co60 gamma and neutron irradiation is also discussed
Keywords :
charge-coupled devices; dark conductivity; elemental semiconductors; gamma-ray effects; neutron effects; proton effects; silicon; 10 MeV; 60 MeV; Si; bulk dark signal; charge coupled devices; damage energy; dark signal nonuniformity; gamma irradiation; neutron irradiation; pixel sizes; proton fluency; proton-induced dark signal; Charge coupled devices; Charge measurement; Charge-coupled image sensors; Current measurement; Insulation; Protons; Signal generators; Silicon; Size measurement; Temperature;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.903795
Filename :
903795
Link To Document :
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