Title :
Design of double-pass electroabsorption modulators with low-voltage, high-speed properties for 40 Gb/s modulation
Author :
Yamada, Koji ; Nakamura, Koji ; Horikawa, Hideaki
Author_Institution :
Semicond. Technol. Lab., Oki Electr. Ind. Co. Ltd., Tokyo, Japan
fDate :
12/1/1997 12:00:00 AM
Abstract :
We discuss device design for electroabsorption (EA) modulators using a double-pass (DP) configuration to attain low-voltage, high-speed operation for wide-wavelength 40 Gb/s optical intensity modulation. It is important to suppress residual antireflective-coated facet reflectivity R1 for the input-output port and on-state propagation loss Abs, on in the waveguide for reducing level change variation Δ caused by the interference effect. As a result, R1<0.5% and Abs, on<1.5 dB are required to obtain Δ less than 1 dB. The most interesting features-reduced drive voltage and improved a figure of merit (bandwidth to drive voltage)-are found theoretically compared to those of conventional a single-pass (SP) configuration. Drive voltage reduction by introducing a DP configuration is clarified: the degree of the reduction is decided by nonlinearity “n” of absorption increase, assuming voltage dependence on increase of the absorption coefficient is proportional to the applied voltage to the n power (V11). For the same device length, the drive voltage is decreased to 2-1n/ leading up to an improvement of a figure of merit up to 21n/. We then present experimental results for fabricated devices having an InGaAsP bulk absorption layer showing small interference effect and large improvement of characteristics. Drive voltages reduced to 52-60% are achieved over a SP configuration with the same waveguide length, which is in good agreement with the theoretical expectation of 2-1n/. Design window for 40 Gb/s modulation appears by introducing a DP configuration even for devices with a bulk absorber. Proper waveguide length design provides high performance with a low drive voltage ~1.2 V, a modulation bandwidth over 30 GHz (showing a figure of merit of ~25 GHz/V), an insertion loss below 8 dB, and a small variation of on-state loss less than 1 dB for wide wavelength range of input light from 1.545 to 1.558 μm. An almost twice larger modulation index is confirmed even under a dynamic condition
Keywords :
III-V semiconductors; absorption coefficients; electro-optical modulation; electroabsorption; gallium arsenide; gallium compounds; high-speed optical techniques; indium compounds; nonlinear optics; optical design techniques; optical losses; reflectivity; refractive index; 1.2 V; 1.545 to 1.558 mum; 40 Gbit/s; 8 dB; Gb/s modulation; Gb/s optical intensity modulation; InGaAsP; InGaAsP bulk absorption layer; absorption coefficient; applied voltage; double-pass electroabsorption modulators; drive voltage; dynamic condition; figure of merit; input-output port; interference effect; larger modulation index; level change variation; low-voltage high-speed properties; on-state loss; on-state propagation loss; residual antireflective-coated facet reflectivity; single-pass configuration; waveguide length design; wavelength range; Absorption; Bandwidth; High speed optical techniques; Intensity modulation; Optical design; Optical devices; Optical modulation; Optical waveguides; Reflectivity; Voltage;
Journal_Title :
Lightwave Technology, Journal of