• DocumentCode
    1441662
  • Title

    Effect of Varied Undoped GaN Thickness on ESD and Optical Properties of GaN-Based LEDs

  • Author

    Chiang, Tsung-Hsun ; Wang, Chun-Kai ; Chang, Shoou-Jinn ; Chiou, Yu-Zung ; Ko, Tsun-Kai ; Lin, Tien-Kun ; Chang, Sheng-Po

  • Author_Institution
    Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
  • Volume
    24
  • Issue
    10
  • fYear
    2012
  • fDate
    5/15/2012 12:00:00 AM
  • Firstpage
    800
  • Lastpage
    802
  • Abstract
    The optical property and electrostatic discharge (ESD) endurance of GaN-based light-emitting diodes (LEDs) with varied undoped GaN thickness are studied and demonstrated. As the undoped GaN thickness increased, the generation of V-shaped defects in the active region was suppressed. Therefore, the output power for a 6-μ.m-thick undoped GaN layer would be enhanced remarkably due to the reduction of nonradiative recombination ratio within the active region. On the other hand, under a reverse ESD pulse voltage of 5.5 kV, the survival rate of the LEDs with an undoped GaN layer thickness of 1.5, 4, and 6 μm were 75%, 65%, and 55%, respectively. It was found that the ESD endurance for a 1.5-μ.m-thick undoped GaN layer with higher internal capacitance was obviously better than others. This could be related to the built-in electric field of LEDs induced by spontaneous polarization field.
  • Keywords
    III-V semiconductors; electrostatic discharge; gallium compounds; light emitting diodes; wide band gap semiconductors; GaN; V-shaped defects; active region; electrostatic discharge; internal capacitance; light emitting diodes; nonradiative recombination ratio; size 1.5 mum; size 4 mum; size 6 mum; spontaneous polarization field; undoped GaN thickness; voltage 5.5 kV; Capacitance; Current measurement; Electrostatic discharges; Gallium nitride; Light emitting diodes; Power generation; Semiconductor device measurement; Electrostatic discharge (ESD); GaN-based light-emitting diodes; nonradiative recombination; output power; spontaneous polarization field;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2012.2186563
  • Filename
    6146401