Title :
Low-Power Die-Level Process Variation and Temperature Monitors for Yield Analysis and Optimization in Deep-Submicron CMOS
Author :
Zjajo, Amir ; Barragan, Manuel J. ; De Gyvez, José Pineda
Author_Institution :
Delft Univ. of Technol., Delft, Netherlands
Abstract :
This paper reports design, efficiency, and measurement results of the process variation and temperature monitors for yield analysis and enhancement in deep-submicron CMOS circuits. Additionally, to guide the verification process with the information obtained through monitoring, two efficient algorithms based on an expectation-maximization method and adjusted support vector machine classifier are proposed. The monitors and algorithms are evaluated on a prototype 12-bit analog-to-digital converter fabricated in standard single poly six-metal 90-nm CMOS.
Keywords :
CMOS integrated circuits; analogue-digital conversion; electronic engineering computing; expectation-maximisation algorithm; integrated circuit design; integrated circuit measurement; optimisation; pattern classification; support vector machines; analog-to-digital converter; deep-submicron CMOS circuit; expectation-maximization method; low-power die-level process variation; optimization; size 90 nm; standard single polysix-metal CMOS circuit; support vector machine classifier; temperature monitoring; verification process; word length 12 bit; yield analysis; Current measurement; Detectors; Monitoring; Resistors; Temperature measurement; Temperature sensors; Transistors; Analog test; process variation monitoring; temperature monitors; yield enhancement;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
DOI :
10.1109/TIM.2012.2184195
