DocumentCode :
1444583
Title :
U-shaped bilayer graphene channel transistor with very high Ion/Ioff ratio
Author :
Moktadir, Z. ; Boden, Stuart A. ; Ghiass, A. ; Rutt, H. ; Mizuta, Hiroshi
Author_Institution :
Sch. of Electron. & Comput. Sci., Univ. of Southampton, Southampton, UK
Volume :
47
Issue :
3
fYear :
2011
Firstpage :
199
Lastpage :
200
Abstract :
A novel graphene transistor architecture is reported. The transistor has a U-shaped geometry and was fabricated using a gallium focused ion beam (FIB). The channel conductance was tuned with a back gate. The Ion/Ioff ratio exceeded 105.
Keywords :
field effect transistors; focused ion beam technology; gallium; graphene; FIB; Ga; U-shaped bilayer graphene channel transistor; U-shaped geometry; back gate; channel conductance; gallium focused ion beam;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2010.3029
Filename :
5710069
Link To Document :
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