DocumentCode :
1445299
Title :
Enhanced Electrical Characteristics of AlGaN-Based SBD With In Situ Deposited Silicon Carbon Nitride Cap Layer
Author :
Lee, Jae-Hoon ; Jeong, Jae-Hyun ; Lee, Jung-Hee
Author_Institution :
GaN Power Res. Group, Samsung LED Co., Ltd., Suwon, South Korea
Volume :
33
Issue :
4
fYear :
2012
fDate :
4/1/2012 12:00:00 AM
Firstpage :
492
Lastpage :
494
Abstract :
AlGaN/GaN Schottky barrier diodes (SBDs) with and without the in situ silicon carbon nitride (SiCN) cap layer were investigated. The fabricated SBD with the SiCN cap layer exhibited improved electrical characteristics, such as the forward turn-on voltage of about 0.7 V, the forward current of 4.1 A at 1.5 V, and the reverse breakdown voltage of 630 V, as compared with the corresponding values of 0.8 V, 3.8 A, and 580 V for the reference SBD without the SiCN cap layer. This improvement in the device performance of the SiCN-SBD is because the in situ SiCN cap layer not only lowers the barrier height but also effectively passivates the surface of the device with better surface morphology.
Keywords :
Schottky barriers; Schottky diodes; aluminium compounds; gallium compounds; passivation; semiconductor device breakdown; silicon compounds; AlGaN-GaN; Schottky barrier diodes; barrier height; current 4.1 A; device surface passivation; electrical characteristics; forward current; forward turn-on voltage; in situ deposited silicon carbon nitride cap layer; reverse breakdown voltage; surface morphology; voltage 0.7 V; voltage 1.5 V; Aluminum gallium nitride; Gallium nitride; Leakage current; Passivation; Schottky barriers; Surface morphology; AlGaN/GaN; Schottky barrier diodes (SBDs); in situ; leakage current; silicon carbon nitride (SiCN) cap layer;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2182671
Filename :
6151013
Link To Document :
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