DocumentCode
1446160
Title
Performance predictions for n-p-n AlxGa1-xN/GaN HBTs
Author
Pulfrey, David L. ; Fathpour, Sasan
Author_Institution
Dept. of Electr. & Comput. Eng., British Columbia Univ., Vancouver, BC, Canada
Volume
48
Issue
3
fYear
2001
fDate
3/1/2001 12:00:00 AM
Firstpage
597
Lastpage
602
Abstract
Predictions of the attainable current gain and cut-off frequency of n-p-n AlxGa1-xN/GaN HBTs are made using compact models. This analytical approach allows the minority-carrier lifetime in the base to be readily identified as a critical parameter in the determination of the gain. For realistic values of lifetime, room-temperature gains in the region of 200-2000 should be attainable, with a graded-base being necessary for highest performance. Gains around 100 are predicted for operation at 600 K. Design of the base is shown to be also important in attaining high cutoff frequencies: a value around 30 GHz would appear to be the upper limit, and its realization would need a graded-base device. Spontaneous polarization is shown to be unlikely to have a major impact on device performance. On the other hand, incomplete ionization of the base dopant is shown to be an important factor
Keywords
III-V semiconductors; aluminium compounds; carrier lifetime; gallium compounds; heterojunction bipolar transistors; minority carriers; semiconductor device models; wide band gap semiconductors; 30 GHz; 600 K; AlGaN-GaN; analytical model; current gain; cut-off frequency; dopant ionization; graded base device; minority carrier lifetime; n-p-n AlxGa1-xN/GaN HBT; spontaneous polarization; Bipolar transistors; Cutoff frequency; Electrons; Gallium nitride; Heterojunction bipolar transistors; Ionization; Numerical models; Performance gain; Photonic band gap; Polarization;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.906457
Filename
906457
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