DocumentCode :
1447467
Title :
Surface etching effect of Co80Pt20-SiO2 granular media
Author :
Kaitsu, I. ; Sato, H. ; Okamoto, I.
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
Volume :
36
Issue :
5
fYear :
2000
fDate :
9/1/2000 12:00:00 AM
Firstpage :
2342
Lastpage :
2344
Abstract :
We have fabricated Co-Pt alloy-SiO2/Cr granular media and etched by RF biasing the magnetic layer surface to reduce the effect of isolation and finer Co-Pt grains. The magnetization decreased slightly with film thickness reduction. The in-plane coercivity Hc was maintained down to a magnetic layer thickness of 11 nm. Meanwhile, the perpendicular Hc decreased with reduced film thickness. This indicates that the magnetization easy axes orientations of the grains in the etched layer were 3D-random and that epitaxial growth occurs on the Cr under layer. Signal at high linear densities was increased with film etching presumably due to the good easy axes orientation of the remaining layer. The signal to media noise ratio was improved by 1 dB but the thermal stability of magnetization was slightly lessened
Keywords :
chromium; cobalt alloys; coercive force; discontinuous metallic thin films; etching; magnetic disc storage; magnetic epitaxial layers; magnetic recording; magnetisation; platinum alloys; silicon compounds; thermal stability; Co80Pt20; Co80Pt20-SiO2-Cr; RF biasing; easy axes orientations; epitaxial growth; granular media; in-plane coercivity; isolation effect reduction; magnetic disk systems; magnetic layer surface; magnetic recording; magnetization; surface etching effect; thermal stability; Amorphous magnetic materials; Chromium; Epitaxial growth; Magnetic films; Magnetic noise; Perpendicular magnetic recording; Saturation magnetization; Signal to noise ratio; Sputter etching; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.908423
Filename :
908423
Link To Document :
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