Magnetron sputtering of CoCr/Cr and CoCrTa/Cr on flexible substrates

Author

Veldeman, J. ; Jia, H. ; Burgelman, M.

Author_Institution

Ghent Univ., Belgium

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

2351

Lastpage

2353

Abstract

In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates. By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples mere characterized by magnetic measurements [hysteresis curve (H _c, M_r, M_s), remanence and δM measurements], and by XRD and AFM

Keywords

X-ray diffraction; atomic force microscopy; chromium; chromium alloys; cobalt alloys; hard discs; magnetic hysteresis; magnetic multilayers; magnetic recording; remanence; sputter deposition; tantalum alloys; AFM; CoCr-Cr; CoCrTa-Cr; X-diffraction; atomic force microscopy; flexible substrates; hard disk; hysteresis curve; magnetic films; magnetron sputtering; remanence; substrate deformation; substrate stress; Chromium; Hard disks; Heating; Magnetic films; Magnetic hysteresis; Magnetic variables measurement; Remanence; Sputtering; Stress; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908426

Filename

908426