Title :
Dual-Gate GaN MMICs for MM-Wave Operation
Author :
Quay, Ruediger ; Tessmann, A. ; Kiefer, R. ; Maroldt, S. ; Haupt, C. ; Nowotny, U. ; Weber, R. ; Massler, H. ; Schwantuschke, D. ; Seelmann-Eggebert, M. ; Leuther, A. ; Mikulla, M. ; Ambacher, O.
Author_Institution :
Fraunhofer Inst. for Appl. Solid-State Phys., Freiburg, Germany
Abstract :
This letter describes the millimeter-wave operation of III-N dual-gate MMICs based on a complete mm-wave MMIC technology suitable for operation up to 110 GHz. The GaN HEMTs have a gate length of 100 nm, yield high maximum transconductance, and very low parasitic capacitances. The cutoff frequency fT is above 80 GHz at an operation bias of 15 V in a fully passivated device. Dual-gate devices were developed for high gain at high gate widths and for substantial improvements in gain per stage on MMIC level. Complete III-N MMICs in grounded coplanar passive technology were designed. A single-stage dual-gate MMIC at 60 GHz yields 150 mW (840 mW/mm) of output power. A second MMIC shows a linear gain of greater than 10 dB at 94 GHz. It further yields an output power of 22.8 dBm (190 mW or 520 mW/mm) in CW-operation to a 50 Ω load with a maximum PAE of 7% at 94 GHz. The letter demonstrates the advantage of GaN dual-gate devices in power gain over common-source devices while maintaining essential improvements in power density.
Keywords :
III-V semiconductors; MMIC; capacitance; gallium compounds; high electron mobility transistors; millimetre wave devices; GaN; HEMT; dual-gate device; frequency 60 GHz; grounded coplanar passive technology; millimeter-wave operation; mm-wave MMIC technology; parasitic capacitance; passivated device; power 150 mW; power gain; single-stage dual-gate MMIC; transconductance; Gain; Gallium nitride; HEMTs; Logic gates; MMICs; MODFETs; Power generation; Field effect transistors (FETs); microwave- and millimeter-wave solid-state devices; power amplifier (PA); wide bandgap transistors;
Journal_Title :
Microwave and Wireless Components Letters, IEEE
DOI :
10.1109/LMWC.2010.2099212