• DocumentCode
    1448206
  • Title

    Hole Effective Masses as a Booster of Self-Consistent Six-Band k \\cdot p Simulation in Inversion Layers of pMOSFETs

  • Author

    Chen, Ming-Jer ; Lee, Chien-Chih ; Cheng, Kuan-Hao

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • Volume
    58
  • Issue
    4
  • fYear
    2011
  • fDate
    4/1/2011 12:00:00 AM
  • Firstpage
    931
  • Lastpage
    937
  • Abstract
    Self-consistently solving the Schrödinger and Poisson´s equations in the six-band k.p context can yield the valence-band structure in the inversion layers of pMOSFETs. In this numerically demanding process, the central processing unit (CPU) time is extraordinarily long. To overcome the hurdle, we construct a novel computational accelerator to intrinsically boost a self-consistent six-band k.p simulation. This accelerator comprises a triangular-potential-based six-band k.p simulator, a hole effective mass approximation (EMA) technique, and an electron analogy version of the self-consistent Schrödinger and Poisson´s equations solver. The outcome of the accelerator furnishes the initial solution of the confining electrostatic potential and is likely close to the realistic one, which is valid for different temperatures, substrate doping concentrations, inversion hole densities, and surface orientations. The results on (001) and (110) substrates are supported by those published in the literature. The overall CPU time is reduced down to around 8% of that without the accelerator. This is the first successful demonstration of the EMA in the self-consistent hole subband structure calculation. The application of the proposed accelerator to more general situations is projected as well.
  • Keywords
    MOSFET; Poisson equation; Schrodinger equation; approximation theory; electric potential; hole density; inversion layers; k.p calculations; semiconductor doping; valence bands; CPU time; Poisson equation; Schrodinger equation; booster; central processing unit; computational accelerator; electrostatic potential; hole effective mass approximation technique; inversion hole density; inversion layer; metal oxide semiconductor field-effect transistor; pMOSFET; self-consistent six-band k.p simulation; substrate doping concentration; triangular-potential-based six-band k.p simulator; valence-band structure; Computational modeling; Doping; Effective mass; Electrostatics; MOSFETs; Mathematical model; Substrates; Effective mass; Schrödinger and Poisson´s equations; hole; metal–oxide–semiconductor field-effect transistors (MOSFETs); model; simulation; two-dimensional hole gas (2DHG); valence-band structure;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2105271
  • Filename
    5711657