Title :
Micromachined planar inductors on silicon wafers for MEMS applications
Author :
Ahn, Chong H. ; Allen, Mark G.
Author_Institution :
Sch. of Electr. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fDate :
12/1/1998 12:00:00 AM
Abstract :
This paper describes three micromachined planar inductors (a spiral type, a solenoid type, and a toroidal meander type) with electroplated nickel-iron permalloy cores which have been realized on a silicon wafer using micromachining techniques. The electrical properties among the fabricated inductors are compared and the related fabrication issues are discussed, with emphasis on the low-temperature CMOS-compatible process, the high current-carrying capacity, the high magnetic flux density, the closed magnetic circuits, and the low product cost. The micromachined on-chip inductors can be applied for magnetic microelectromechanical systems devices, such as micromotors, microactuators, microsensors, and integrated power converters, which envisages new micropower magnetics on a chip with integrated circuits
Keywords :
inductors; micromachining; micromechanical devices; MEMS applications; closed magnetic circuits; electrical properties; electroplated nickel-iron permalloy cores; high current-carrying capacity; high magnetic flux density; integrated circuits; integrated power converters; low product cost; low-temperature CMOS-compatible process; magnetic microelectromechanical systems devices; microactuators; micromachined on-chip inductors; micromachined planar inductors; micromachining techniques; micromotors; micropower magnetics; microsensors; silicon wafer; silicon wafers; solenoid type inductor; spiral type inductor; toroidal meander type inductor; Fabrication; Inductors; Magnetic cores; Magnetic flux density; Magnetic properties; Micromachining; Micromechanical devices; Silicon; Solenoids; Spirals;
Journal_Title :
Industrial Electronics, IEEE Transactions on