DocumentCode :
1448980
Title :
Resolution enhancement by applying MFM under UHV conditions
Author :
Dreyer, Michael ; Gomez, Romel D. ; Mayergoyz, Isaak D.
Author_Institution :
Lab. for Phys. Sci., College Park, MD, USA
Volume :
36
Issue :
5
fYear :
2000
fDate :
9/1/2000 12:00:00 AM
Firstpage :
2975
Lastpage :
2977
Abstract :
The enhancement in signal-to-noise ratio and lateral resolution in MFM in going from ambient pressure to UHV is demonstrated. The performance of several cantilevers is evaluated using a patterned 50 nm thick permalloy film, with cross-tie as well as ~90° domain walls, and a 200 nm thick permalloy film with perpendicular magnetization. The increase in the quality factor of the cantilever oscillation in UHV improves the sensitivity, consequently allowing less magnetic material on the tip to achieve the same signal-to-noise ratio. This reduction in magnetic volume sharpens the lateral resolution. We also demonstrate that the magnetic interaction can be so weak that a magnetic contrast is visible only under UHV conditions
Keywords :
Permalloy; magnetic domain walls; magnetic force microscopy; magnetic thin films; magnetisation; MFM; NiFe; UHV conditions; cantilevers; domain walls; lateral resolution; magnetic contrast; magnetic force microscopy; magnetic volume; permalloy film; perpendicular magnetization; resolution enhancement; signal-to-noise ratio enhancement; Atomic force microscopy; Force measurement; Frequency measurement; Magnetic domain walls; Magnetic films; Magnetic force microscopy; Magnetization; Signal resolution; Signal to noise ratio; Spatial resolution;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.908645
Filename :
908645
Link To Document :
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