Spin stand study of density dependence of switching proprieties in patterned media

Author

Lin, Xiangdong ; Zhu, Jian-Gang ; Messner, William

Author_Institution

Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

2999

Lastpage

3001

Abstract

The recording processes of patterned bits with different bit length generated by focused ion beam etching are investigated by spin stand testing. Compared to conventional written transitions, the magnetization switching of patterned bits requires much smaller write fields. Also the write field gradient is no longer critical to the sharpness of the transition of patterned bits. Experimental results demonstrate that from the standpoint of recording, patterned media is a good solution for ultra-high density magnetic recording

Keywords

focused ion beam technology; magnetic recording; magnetic switching; magnetisation reversal; sputter etching; bit length; density dependence; focused ion beam etching; magnetization switching; patterned bits; patterned media; recording processes; small write fields; spin stand; switching proprieties; ultra-high density magnetic recording; write field gradient; Decision support systems; Etching; Ion beams; Jitter; Magnetic films; Magnetic noise; Magnetic recording; Saturation magnetization; Testing; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908655

Filename

908655