Title :
Effect of post-annealing on ultra-high frequency properties of amorphous Fe-Co-B thin films
Author :
Chen, L.H. ; Shih, Y.H. ; Ellis, K.A. ; Jin, S. ; van Dover, R.B. ; Klemmer, T.J.
Author_Institution :
Dept. of Mater. Eng., I-Shou Univ., Kaohsiung, Taiwan
fDate :
9/1/2000 12:00:00 AM
Abstract :
In this paper, FeCoB amorphous thin films were deposited on glass substrates using a triode sputtering source under a uniform applied magnetic field. The as-deposited films exhibit a low coercivity of ~1.7 Oe, a high anisotropy field of ~37 Oe and 4πMs~17.5 kG, when sputtered with a bias voltage of 180 V. The large anisotropy fields and saturations in these films result in a ferromagnetic resonance frequency as high as ~2.63 GHz, a relative permeability μ\´ of ~400-500 and a low dissipation μ" of 10-30 in the frequency range of 0.1-1 GHz. Upon subsequent annealing at 200-400°C for 2 hrs, the magnetic properties of the films are found to be affected significantly. The magnetic properties of the as-deposited and the annealed films have been compared with a considering of the microstructure modification during annealing
Keywords :
annealing; boron alloys; cobalt alloys; coercive force; ferromagnetic resonance; iron alloys; magnetic anisotropy; magnetic permeability; magnetic thin films; sputtered coatings; 0.1 to 1 GHz; 200 to 400 degC; FeCoB; UHF properties; amorphous thin films; anisotropy field; annealing; coercivity; ferromagnetic resonance; glass substrates; microstructure modification; relative permeability; triode sputtering source; uniform applied magnetic field; Amorphous materials; Anisotropic magnetoresistance; Annealing; Coercive force; Frequency; Glass; Magnetic fields; Magnetic films; Magnetic properties; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
