Effect of post-annealing on ultra-high frequency properties of amorphous Fe-Co-B thin films

Author

Chen, L.H. ; Shih, Y.H. ; Ellis, K.A. ; Jin, S. ; van Dover, R.B. ; Klemmer, T.J.

Author_Institution

Dept. of Mater. Eng., I-Shou Univ., Kaohsiung, Taiwan

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

3418

Lastpage

3420

Abstract

In this paper, FeCoB amorphous thin films were deposited on glass substrates using a triode sputtering source under a uniform applied magnetic field. The as-deposited films exhibit a low coercivity of ~1.7 Oe, a high anisotropy field of ~37 Oe and 4πM_s~17.5 kG, when sputtered with a bias voltage of 180 V. The large anisotropy fields and saturations in these films result in a ferromagnetic resonance frequency as high as ~2.63 GHz, a relative permeability μ\´ of ~400-500 and a low dissipation μ" of 10-30 in the frequency range of 0.1-1 GHz. Upon subsequent annealing at 200-400°C for 2 hrs, the magnetic properties of the films are found to be affected significantly. The magnetic properties of the as-deposited and the annealed films have been compared with a considering of the microstructure modification during annealing

Keywords

annealing; boron alloys; cobalt alloys; coercive force; ferromagnetic resonance; iron alloys; magnetic anisotropy; magnetic permeability; magnetic thin films; sputtered coatings; 0.1 to 1 GHz; 200 to 400 degC; FeCoB; UHF properties; amorphous thin films; anisotropy field; annealing; coercivity; ferromagnetic resonance; glass substrates; microstructure modification; relative permeability; triode sputtering source; uniform applied magnetic field; Amorphous materials; Anisotropic magnetoresistance; Annealing; Coercive force; Frequency; Glass; Magnetic fields; Magnetic films; Magnetic properties; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908846

Filename

908846