Title :
Soft magnetic properties and microstructure of high moment Fe-N-Al-O films for recording heads
Author :
Ikeda, Shoji ; Uehara, Yuji ; Tagawa, Ikuya ; Takeguchi, Naoki ; Kakehi, Masahiro
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
fDate :
9/1/2000 12:00:00 AM
Abstract :
Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N2 plasma. The Al and O contents in films were varied by the area ratio of Al2O3 chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical properties of the Fe-N-Al-O films, and we investigated the relationship between soft magnetic properties and microstructure. The permeability reaches a maximum of about 1800, when the Al+O content range is 10-16 at%
Keywords :
crystal microstructure; electrical resistivity; iron compounds; magnetic heads; magnetic permeability; magnetic recording; magnetic thin films; magnetisation; nitrogen compounds; soft magnetic materials; sputtered coatings; FeNAlO; RF reactive sputtering; electrical resistivity; high moment films; magnetic properties; microstructure; permeability; recording heads; saturation magnetization; soft magnetic properties; Conductivity; Iron; Magnetic films; Magnetic heads; Magnetic materials; Magnetic properties; Magnetic recording; Microstructure; Saturation magnetization; Soft magnetic materials;
Journal_Title :
Magnetics, IEEE Transactions on
