Soft magnetic properties and microstructure of high moment Fe-N-Al-O films for recording heads

Author

Ikeda, Shoji ; Uehara, Yuji ; Tagawa, Ikuya ; Takeguchi, Naoki ; Kakehi, Masahiro

Author_Institution

Fujitsu Labs. Ltd., Atsugi, Japan

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

3470

Lastpage

3472

Abstract

Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N₂ plasma. The Al and O contents in films were varied by the area ratio of Al₂O₃ chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical properties of the Fe-N-Al-O films, and we investigated the relationship between soft magnetic properties and microstructure. The permeability reaches a maximum of about 1800, when the Al+O content range is 10-16 at%

Keywords

crystal microstructure; electrical resistivity; iron compounds; magnetic heads; magnetic permeability; magnetic recording; magnetic thin films; magnetisation; nitrogen compounds; soft magnetic materials; sputtered coatings; FeNAlO; RF reactive sputtering; electrical resistivity; high moment films; magnetic properties; microstructure; permeability; recording heads; saturation magnetization; soft magnetic properties; Conductivity; Iron; Magnetic films; Magnetic heads; Magnetic materials; Magnetic properties; Magnetic recording; Microstructure; Saturation magnetization; Soft magnetic materials;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908863

Filename

908863