DocumentCode
1450844
Title
Impact of Time-Varying Loads on the Programmable Pulsed Power Driver Called Genesis
Author
Glover, Steven F. ; Davis, J.-P. ; Schneider, Larry X. ; Reed, K.W. ; Pena, Gary E. ; Hall, C.A. ; Hanshaw, H.L. ; Hickman ; Hodge, K.C. ; Lemke, R.W. ; Lehr, Jane M. ; Lucero, Diego J. ; McDaniel, Dillon H. ; Puissant, J.G. ; Rudys, Joseph M. ; Sceiford,
Author_Institution
Sandia Nat. Labs., Albuquerque, NM, USA
Volume
40
Issue
10
fYear
2012
Firstpage
2588
Lastpage
2596
Abstract
The success of dynamic materials properties research at Sandia National Laboratories has led to research into ultralow impedance, compact pulsed power systems capable of multi-MA shaped current pulses with rise times ranging from 220 to 500 ns. The Genesis design consists of two hundred and forty 200 kV, 80 kA modules connected in parallel to a solid dielectric disk transmission line and is capable of producing 280 kbar of magnetic pressure (>; 500 kbar pressure in high Z materials) in a 1.75 nH, 20-mm wide stripline load. Stripline loads operating under these conditions expand during the experiment resulting in a time-varying load that can impact the performance and lifetime of the system. This paper provides analysis of time-varying stripline loads and the impact of these loads on system performance. Further, an approach to reduce dielectric stress levels through active damping is presented as a means to increase system reliability and lifetime.
Keywords
driver circuits; genetic algorithms; pulsed power supplies; reliability; transmission lines; compact pulsed power systems; current 80 kA; dielectric stress levels; genesis; programmable pulsed power driver; solid dielectric disk transmission line; system reliability; time 220 ns to 500 ns; time-varying stripline loads; voltage 200 kV; Electrodes; Inductance; Magnetic separation; Magnetohydrodynamics; Magnetomechanical effects; Materials; Stripline; Current control; dynamic load; equation of state; genetic algorithms; isentropic compression; modeling; programmable control; pulse shaping; pulsed power;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2012.2185070
Filename
6153385
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