Study of in-depth defects using magneto-optical Kerr effect by measuring the magnetic hardness coefficient in magnetic thin films

Author

Leong, Siang Huei ; Wang, Jian Ping ; Low, Teck Seng

Author_Institution

Data Storage Inst., Singapore

Volume

36

Issue

5

fYear

2000

fDate

9/1/2000 12:00:00 AM

Firstpage

3611

Lastpage

3613

Abstract

A magneto-optical Kerr effect (MOKE) system was built and used for acquiring saturation magnetization curves and measuring the magnetic hardness coefficient, a of magnetic thin film samples. Co thin films were sputtered on glass substrate under various sputtering conditions. The magnetic hardness coefficient was measured using the MOKE setup. Results for α (Oe) were further correlated using transmission electron microscopy and X-ray diffraction analysis. It was found that α (Oe), a useful indicator for in-depth defects in Co films, increased with both working and base pressure but decreased with higher deposition temperatures. This trend is in agreement with well-known microstructure control techniques by changing sputtering parameters

Keywords

Kerr magneto-optical effect; cobalt; coercive force; ferromagnetic materials; flaw detection; magnetic hysteresis; magnetic thin films; magnetic variables measurement; remanence; sputter deposition; sputtered coatings; Co; Kerr hysteresis loop; XRD analysis; coercivity; in-depth defects; magnetic hardness coefficient measurement; magnetic thin films; magneto-optical Kerr effect; microstructure control; remanence; saturation magnetization curves; sputtered films; sputtering parameters change; transmission electron microscopy; Glass; Kerr effect; Magnetic analysis; Magnetic films; Magnetooptic effects; Saturation magnetization; Sputtering; Substrates; Transmission electron microscopy; X-ray diffraction;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.908917

Filename

908917