DocumentCode :
1451928
Title :
Design of Compact ESD Protection Circuit for V-Band RF Applications in a 65-nm CMOS Technology
Author :
Lin, Chun-Yu ; Chu, Li-Wei ; Tsai, Shiang-Yu ; Ker, Ming-Dou
Author_Institution :
Inst. of Electron., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
12
Issue :
3
fYear :
2012
Firstpage :
554
Lastpage :
561
Abstract :
Nanoscale CMOS technologies have been widely used to implement radio-frequency (RF) integrated circuits. However, the thinner gate oxide and silicided drain/source in nanoscale CMOS technologies seriously degraded the electrostatic discharge (ESD) robustness of RF circuits. Against ESD damage, an on-chip ESD protection design must be included in the RF circuits. As the RF circuits operate in the higher frequency band, the parasitic effect from ESD protection circuit must be strictly limited. To provide the effective ESD protection for a 60-GHz low-noise amplifier with less RF performance degradation, two new ESD protection circuits were studied in a 65-nm CMOS process. Such compact ESD protection circuits have been successfully verified in silicon chip to achieve the 2-kV human-body-model ESD robustness with the low insertion loss in small layout area. With the better performances, the proposed ESD protection circuits were very suitable for V-band RF ESD protection.
Keywords :
CMOS analogue integrated circuits; electrostatic discharge; field effect MIMIC; low noise amplifiers; millimetre wave amplifiers; RF integrated circuits; V-band RF ESD protection; compact ESD protection circuit design; electrostatic discharge; frequency 60 GHz; human-body-model ESD robustness; low insertion loss; low-noise amplifier; nanoscale CMOS technology; on-chip ESD protection design; parasitic effect; radiofrequency integrated circuits; silicided drain-source; size 65 nm; voltage 2 kV; Capacitors; Clamps; Electrostatic discharges; Impedance; Inductors; Insertion loss; Radio frequency; CMOS; V-band; electrostatic discharge (ESD) protection; radio frequency (RF);
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2012.2188405
Filename :
6155079
Link To Document :
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