DocumentCode :
1452184
Title :
Study of repetitive plasma opening switch generator technology
Author :
Dolgachev, Georgi I. ; Zakatov, Lev P. ; Ushakov, Andrey G.
Author_Institution :
Dept. of Appl. Phys., Kurchatov (I.V.) Inst. of Atomic Energy, Moscow, Russia
Volume :
26
Issue :
5
fYear :
1998
fDate :
10/1/1998 12:00:00 AM
Firstpage :
1410
Lastpage :
1419
Abstract :
Repetitive plasma opening switch (POS) research for X-ray and electron beam generators for commercial applications is reviewed. This research was started on the RS-20 generator in 1991 with submicrosecond conduction times, 100 kA currents, and MV voltages. In the experiments wall-plug to electron beam production efficiency was increased from 10-50%. Maximum voltage obtained at POS was 3 MV starting from 0.8 MV at the Marx generator. POS operation was improved using an applied external magnetic field for the opening phase. Diode current and total generator efficiency were increased by combining the POS and diode system in one technology unit. For the opening phase of the high-impedance, repetitive POS, a set of conditions based on early POS experiments in the Kurchatov Institute were proposed. Repetitive POS generators have obtained peak X-ray dose rates of 1 MGy/s and electron dose rates of 10 GGy/s. This may be important for applications as pulsed irradiation may cause more efficient sterilization at lower doses. An X-ray generator based on repetitive POS technology at 5 MV and 200 kW in the electron beam is proposed
Keywords :
X-ray production; electron beams; plasma switches; switchgear; 0.8 MV; 100 kA; 200 kW; 3 MV; 5 MV; MV voltages; Marx generator; RS-20 generator; X-ray beam generators; applied external magnetic field; diode current; electron beam generators; pulsed irradiation; repetitive plasma opening switch generator technology; submicrosecond conduction times; total generator efficiency; Current measurement; Diodes; Electron beams; Insulation; Magnetic fields; Plasma applications; Plasma x-ray sources; Pulse generation; Switches; Voltage;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.736027
Filename :
736027
Link To Document :
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