• DocumentCode
    1452466
  • Title

    Narrow-Flow-Channel-Driven EHD Gas Pump for an Advanced Thermal Management of Microelectronics

  • Author

    Chang, Jen-Shih ; Tsubone, Hiroaki ; Harvel, Glenn D. ; Urashima, Kuniko

  • Author_Institution
    Dept. of Eng. Phys., McMaster Univ., Hamilton, ON, Canada
  • Volume
    46
  • Issue
    3
  • fYear
    2010
  • Firstpage
    1151
  • Lastpage
    1158
  • Abstract
    In order to study the feasibility of applying electrohydrodynamic (EHD) gas pumps for advanced thermal management of microelectronics, an experimental investigation was conducted to drive gas flow through a narrow flow channel by an EHD gas pump. The net gas flow induced by corona discharge was generated by a push-fan (PF)-type EHD gas pump with and without a partially covered corona wire and nonparallel ground plate electrodes to transfer gas through millimeter-order circular channels. Therefore, it is important to know the effect of a narrow channel on the characteristics of the EHD gas pump with the corona wire electrode covered. The results show that the effects of narrow circular flow channels significantly influence the flow characteristics of the PF-type EHD gas pump and that the use of an insulator on the corona wire electrode can significantly enhance the current flux density and the pump performance under dc positive applied voltage.
  • Keywords
    channel flow; corona; current density; discharges (electric); electrohydrodynamics; electronics industry; fans; magnetic flux; pumps; thermal management (packaging); EHD gas pump; corona discharge; corona wire electrode; current flux density; dc positive applied voltage; electrohydrodynamic gas pumps; flow characteristics; gas flow; microelectronics; millimeter-order circular channel; narrow circular flow channel; nonparallel ground plate electrode; pump performance; push-fan; thermal management; Corona discharge; electrohydrodynamic (EHD); gas pump; pressure generation; wire-nonparallel plate;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/TIA.2010.2045326
  • Filename
    5438744