DocumentCode :
1452554
Title :
Ridged LiNbO 
Waveguide Fabricated By a Novel Wet Etching/MeV Oxygen Ion Implantation Method
Author :
Wang, Lei ; Zhao, Jin-Hua ; Fu, Gang
Author_Institution :
Sch. of Phys., Shandong Univ., Jinan, China
Volume :
28
Issue :
9
fYear :
2010
fDate :
5/1/2010 12:00:00 AM
Firstpage :
1344
Lastpage :
1348
Abstract :
We report on a new wet etching/ion implantation method for fabricating ridge waveguide on z -cut LiNbO3. The ridge structures are produced on LiNbO3 crystal by anisotropic wet etching via minus z face. Mode guiding at wavelength of 632.8 nm has been realized by using direct 4.5 MeV oxygen implantation without any implantation mask. The ridge waveguide shows a reduced propagation loss of 1.3 dB/cm after the thermal annealing process.
Keywords :
annealing; etching; ion implantation; lithium compounds; optical waveguides; ridge waveguides; LiNbO3; anisotropic wet etching; electron volt energy 4.5 MeV; oxygen ion implantation; ridged lithium niobate waveguide; thermal annealing process; wavelength 632.8 nm; z-cut lithium niobate; Ion implantation; lithium compounds; ridge waveguide;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2010.2045877
Filename :
5438757
Link To Document :
