• DocumentCode
    1452554
  • Title

    Ridged LiNbO _{3} Waveguide Fabricated By a Novel Wet Etching/MeV Oxygen Ion Implantation Method

  • Author

    Wang, Lei ; Zhao, Jin-Hua ; Fu, Gang

  • Author_Institution
    Sch. of Phys., Shandong Univ., Jinan, China
  • Volume
    28
  • Issue
    9
  • fYear
    2010
  • fDate
    5/1/2010 12:00:00 AM
  • Firstpage
    1344
  • Lastpage
    1348
  • Abstract
    We report on a new wet etching/ion implantation method for fabricating ridge waveguide on z -cut LiNbO3. The ridge structures are produced on LiNbO3 crystal by anisotropic wet etching via minus z face. Mode guiding at wavelength of 632.8 nm has been realized by using direct 4.5 MeV oxygen implantation without any implantation mask. The ridge waveguide shows a reduced propagation loss of 1.3 dB/cm after the thermal annealing process.
  • Keywords
    annealing; etching; ion implantation; lithium compounds; optical waveguides; ridge waveguides; LiNbO3; anisotropic wet etching; electron volt energy 4.5 MeV; oxygen ion implantation; ridged lithium niobate waveguide; thermal annealing process; wavelength 632.8 nm; z-cut lithium niobate; Ion implantation; lithium compounds; ridge waveguide;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2010.2045877
  • Filename
    5438757
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1452554