Amorphous silicon-based guided-wave passive and active devices for silicon integrated optoelectronics

Waveguides and interferometric light amplitude modulators for application at the 1.3- and 1.55-μm fiber communication wavelengths have been fabricated with thin-film hydrogenated amorphous silicon and its related alloys. The technique adopted for the thin-film growth is the plasma- enhanced chemical vapor deposition, which has been shown to give the lowest defect concentration in the film. Consequently the proposed waveguiding structures take advantage of the low optical absorption shown by a-Si:H at photon energies below the energy gap. In addition a good radiation confinement can be obtained thanks to the bandgap tailoring opportunity offered by this simple and inexpensive technology. In particular rib waveguides, based on a a-SiC:H/a-Si:H stack, have been realized on crystal silicon, showing low propagation losses. Recently, however, a new interest as low as 0.7 dB/cm. The same structure has been utilized for the fabrication of thermooptic Fabry-Perot modulators with switching times of 10 μs. Modulators based on the alternative waveguiding configuration ZnO/a-Si:H, giving comparable results, are also presented