DocumentCode :
1453132
Title :
Electrostatic deposition of CVD particles for fabrication of ultrafine ceramic filter
Author :
Yamamoto, Hiroshi
Author_Institution :
Inst. of Ind. Sci., Tokyo Univ.
Volume :
27
Issue :
2
fYear :
1991
Firstpage :
307
Lastpage :
310
Abstract :
A novel method for forming a ceramic membrane was devised. Ultrafine particles of silicon nitride synthesized by thermally activated chemical vapor deposition (CVD) were deposited on an outer wall surface of a porous ceramic tube (substrate) by electrostatic force and sintered in an inert gas atmosphere. The ceramic-made electrode assembly using surface discharge was used for charging ultrafine particles at an elevated temperature. Special ceramic membranes with a three-dimensional network for use as a fiber filter were obtained by this method. The effective pore size was around 0.2-1.0 μm in diameter, and its porosity was extremely large. This structure has the advantage of allowing microfiltration with a very low pressure drop
Keywords :
CVD coatings; ceramics; chemical vapour deposition; electrodeposition; electrodeposits; electrostatics; porosity; silicon compounds; sintering; 0.2 to 1.0 micron; CVD; Si3N4; electrostatic deposition; inert gas atmosphere; microfiltration; pore size; porosity; porous ceramic tube; sintering; surface discharge; thermally activated chemical vapor deposition; ultrafine ceramic filter; Atmosphere; Biomembranes; Ceramics; Chemical vapor deposition; Electrostatics; Fabrication; Silicon; Surface charging; Surface discharges; Thermal force;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.73617
Filename :
73617
Link To Document :
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