• DocumentCode
    1453209
  • Title

    Comparative Study of MOSFET and IGBT for High Repetitive Pulsed Power Modulators

  • Author

    Jang, Sung-Roc ; Ryoo, Hong-Je ; Goussev, Gennadi ; Rim, Geun Hie

  • Author_Institution
    Electr. Propulsion Res. Center, Korea Electrotechnol. Res. Inst., Changwon, South Korea
  • Volume
    40
  • Issue
    10
  • fYear
    2012
  • Firstpage
    2561
  • Lastpage
    2568
  • Abstract
    This paper presents an investigation of semiconductor switches for high voltage solid-state pulsed power modulators from the viewpoint of pulse rising time, efficiency, and reliability. A comparative study of insulated gate bipolar transistor (IGBT) and metal oxide semiconductor field effect transistor (MOSFET) devices is provided, focusing particularly on the characteristics of each device for pulsed power applications. Two kinds of stacks for 10-kV pulses are developed with a high voltage capacitor charger in order to experimentally compare the characteristics of each device. Although the structure of each stack is similar, the number of power cells for the 10-kV pulse is different due to the device voltage rating. The power cell voltage for IGBT and MOSFET-based stacks is about 840 V and 560 V, respectively. Therefore, two types of transformer, with six secondary windings for the IGBT stack and nine secondary windings for the MOSFET stack, are also designed for storage capacitor charging. Moreover, the ease of varying the pulse repetition rate and the pulse width shows the advantages of the developed modulators in facilitating the measurement of device characteristics in different pulse output conditions. The experiments are performed with noninductive resistor loads, and the results of the comparison tests are discussed. In addition, the results prove that the developed modulator can be effectively used for high repetitive pulsed power applications.
  • Keywords
    insulated gate bipolar transistors; modulators; pulsed power switches; semiconductor switches; windings; IGBT; MOSFET-based stacks; high repetitive pulsed power applications; high repetitive pulsed power modulators; high voltage solid-state pulsed power modulators; insulated gate bipolar transistor; metal oxide semiconductor field effect transistor; noninductive resistor loads; pulse repetition rate; pulse rising time; pulse width; reliability; secondary windings; semiconductor switches; voltage 10 kV; Capacitors; Insulated gate bipolar transistors; Logic gates; MOSFET circuits; Modulation; Stacking; Switches; Gate drive circuit; high-voltage capacitor charger; pulsed power applications; solid-state pulsed power modulator;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2012.2186592
  • Filename
    6155610