Title :
Measurement of facet reflectivity of antireflection-coated electroabsorption modulator using induced photocurrent
Author :
Byung-Kwon Kang ; Yoon Ho Park ; Seok Lee ; Sang Sam Choi ; Jungkeun Lee ; Kamiya, T. ; Seung-Han Park
Author_Institution :
Dept. of Phys., Yonsei Univ., Seoul, South Korea
fDate :
2/1/2001 12:00:00 AM
Abstract :
A new method to measure the facet reflectivity of an antireflection (AR)-coated electroabsorption (EA) modulator in the region of operating wavelengths is proposed. First, by measuring the induced photocurrent and reflectance simultaneously at the front facet of an EA waveguide, the cleaved facet reflectivity and propagation loss are determined. After coating the facet with AR, the residual reflectivity of AR-coated facet is obtained from the measured photocurrent spectra and the predetermined facet reflectivity. We demonstrate the reflectivity of a double-layer AR-coated EA modulator can be measured to be /spl sim/4×10/sup -4/ at 1.55 μm for TE polarization by using the proposed technique.
Keywords :
III-V semiconductors; antireflection coatings; electro-optical modulation; electroabsorption; gallium arsenide; gallium compounds; indium compounds; optical fabrication; optical films; optical loss measurement; optical waveguide components; photoconductivity; quantum well devices; reflectivity; 1.55 mum; EA waveguide; InGaAsP-InGaAsP; TE polarization; TiO/sub 2/-SiO/sub 2/; anti-reflection-coated facet; antireflection-coated electroabsorption modulator; cleaved facet reflectivity; double-layer anti-reflection-coated electro-absorption modulator; facet reflectivity; front facet; induced photocurrent; operating wavelengths; photocurrent spectra; propagation loss; reflectance; reflectivity; residual reflectivity; Chirp modulation; Coatings; Interference; Loss measurement; Optical waveguides; Photoconductivity; Propagation losses; Reflectivity; Tellurium; Wavelength measurement;
Journal_Title :
Photonics Technology Letters, IEEE