DocumentCode :
1453894
Title :
Modeling of the subthreshold characteristics of SOI MOSFETs with floating body
Author :
Matloubian, Mishel ; Chen, C.-E.D. ; Mao, Bor-yen ; Sundaresan, Ravishankar ; Pollack, Gordon P.
Volume :
37
Issue :
9
fYear :
1990
fDate :
9/1/1990 12:00:00 AM
Firstpage :
1985
Lastpage :
1994
Abstract :
n-channel SOI MOSFETs with floating bodies show a threshold voltage shift and an improvement in subthreshold slope at high drain biases. The magnitude of this effect depends on the device parameters and the starting SOI substrate. A simple device model is presented that explains the observed characteristics to be due to MOS back-bias effects resulting from the positively charged floating body. The improvement in the subthreshold slope is the outcome of positive feedback between the body potential and the transistor channel current
Keywords :
insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; MOS back-bias effects; SOI MOSFETs; body potential; device parameters; floating body; high drain biases; positive feedback; positively charged floating body; simple device model; starting substrate; subthreshold characteristics; subthreshold slope; threshold voltage shift; transistor channel current; CMOS process; Circuit optimization; Feedback; Instruments; Isolation technology; MOSFETs; Process design; Silicon on insulator technology; Substrates; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.57160
Filename :
57160
Link To Document :
بازگشت