Title :
Electrical characteristics of 4.5 kV implanted anode 4H-SiC p-i-n junction rectifiers
Author :
Fedison, Jeffrey B. ; Ramungul, Nudjarin ; Chow, T. Paul ; Ghezzo, Mario ; Kretchmer, James W.
Author_Institution :
GE Corp. Res. & Dev., Schenectady, NY, USA
fDate :
3/1/2001 12:00:00 AM
Abstract :
4500 V 4H-SiC p-i-n junction rectifiers with low on-state voltage drop (3.3-4.2 V), low reverse leakage current (3/spl times/10/sup -6/ A/cm/sup 2/), and fast switching (30-70 ns) have been fabricated and characterized. Forward current-voltage measurements indicate a minimum ideality factor of 1.2 which confirms a recombination process involving multiple energy levels. Reverse leakage current exhibits a square root dependence on voltage below the punchthrough voltage where leakage currents of less than 3/spl times/10/sup -6/ A/cm/sup 2/ are measured. Reverse recovery measurements are presented which indicate the presence of recombination at the junction perimeter where a surface recombination velocity of 2-8/spl times/10/sup 5/ cm/s is found. These measurements also indicate drift layer bulk carrier lifetimes ranging from 74 ns at room temperature to 580 ns at 250/spl deg/C.
Keywords :
anodes; carrier lifetime; ion implantation; leakage currents; p-i-n diodes; power semiconductor diodes; silicon compounds; solid-state rectifiers; surface recombination; wide band gap semiconductors; 4.5 kV; 4H-SiC p-i-n junction rectifier; SiC; blocking voltage; current-voltage characteristics; drift layer bulk carrier lifetime; electrical characteristics; ideality factor; implanted anode; on-state voltage drop; power switching device; punchthrough voltage; reverse leakage current; reverse recovery; surface recombination velocity; Anodes; Current measurement; Electric variables; Energy measurement; Energy states; Leakage current; Low voltage; PIN photodiodes; Rectifiers; Velocity measurement;
Journal_Title :
Electron Device Letters, IEEE