• DocumentCode
    1454531
  • Title

    Modeling of mismatch effect in submicron MOSFETs based on BSIM3 model and parametric tests

  • Author

    Zhang, Q. ; Liou, J.J. ; McMacken, J. ; Thomson, J. ; Layman, P.

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Univ. of Central Florida, Orlando, FL, USA
  • Volume
    22
  • Issue
    3
  • fYear
    2001
  • fDate
    3/1/2001 12:00:00 AM
  • Firstpage
    133
  • Lastpage
    135
  • Abstract
    Mismatch between identically designed MOS transistors plays an important role in the performance of analog circuits. This paper reports a MOS transistor mismatch model applicable for submicron CMOS technology and developed based on the industry standard BSIM3v3 model. A quick way to estimate drain current mismatch based on parametric test data was also suggested.
  • Keywords
    MOSFET; semiconductor device models; semiconductor device testing; BSIM3v3 model; CMOS technology; analog circuit; drain current; mismatch effect; parametric testing; submicron MOSFET; Analog circuits; CMOS technology; Circuit testing; Helium; MOSFETs; Semiconductor device measurement; Semiconductor device modeling; Semiconductor process modeling; Standards development; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.910620
  • Filename
    910620